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07 Fully Funded PhD Programs at Advanced Research Center for Nanolithography, Netherlands

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Are you holding Master’s degree and looking for fully funded PhD positions? Advanced Research Center for Nanolithography, Netherlands invites online application for multiple funded PhD Programs / fully funded PhD positions in various research areas.

Candidates interested in fully funded PhD positions can check the details and may apply as soon as possible. Interested and eligible applicants may submit their online application for PhD programs via the University’s Online Application Portal. 

1. Fully Funded PhD Position in Nanowear – does diamond last forever?

Summary of PhD Program:

Are you interested in simultaneously unraveling the fundamentals of wear and contributing to the solution to wear-related challenges in computer chip production? At the Advanced Research Center for Nanolithography, we work with ASML on new processes to fabricate the electronic chips that power nearly every sector in the world. These chips are fabricated onto silicon wafers. During fabrication, nanometre scale relative displacements between the silicon wafer and the wafer positioner lead to unpredictable friction forces and wear which in turn cause in-plane deformations in the wafer, limiting the achievable feature size in chips.

Application Deadline: Open until filled

Apply now

2. Fully Funded PhD Position in Resolving Surface Reactions in Plasma Catalysis

Summary of PhD Program:

Renewable energy is key to tackling climate change and reducing our dependence on fossil fuels. The intermittent supply of renewable energy hampers its efficient usage and creates a pressing need for innovative energy conversion approaches. Energy-to-fuel conversion using plasma-assisted catalytic conversion is highly promising for producing urgently needed fuels from greenhouse gases. In plasma catalysis, reactants are activated in a plasma discharge, allowing for remarkable efficiencies beyond the limits of thermal catalysis. The catalyst surface defines the reaction pathway and selectivity, and is thus key in catalyst design. However, at present the active state of catalyst surfaces in plasma is unknown, limiting the impact of plasma catalysis by inhibiting the design of dedicated plasma catalysts.

Application Deadline: Open until filled

Apply now

 

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3. Fully Funded PhD Position in Superresolution terahertz microscopy of semiconductors and 2D materials

Summary of PhD Program:

In this project you will work on expanding our capabilities to perform optical metrology in the terahertz spectral range, by helping to design, build and apply a terahertz time-domain spectroscopy microscope. The microscope will use femtosecond lasers to generate and detect terahertz pulses using non-linear optical techniques. You will then apply the THz microscope to measure and understand the conductivity of 2D and 3D materials on the micrometer and nanometer scale. In one planned mode of operation the THz microscope will be used in combination with a camera, to take THz pictures with several micrometers spatial resolution in a single laser shot.

Application Deadline: Open until filled

Apply now

 

4. Fully Funded PhD Position in Speckle control with optical shaping

Summary of PhD Program:

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff.

Application Deadline: Open until filled

Apply now

 

5. Fully Funded PhD Position in Solid-State Laser-produced Plasma Sources of EUV Light

Summary of PhD Program:

Advanced semiconductor devices are produced using extreme ultraviolet (EUV) light at just 13.5nm wavelength. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. EUVL is powered by light that is produced in the interaction of high-energy CO2-gas laser pulses with molten tin microdroplets.

The use of such lasers leads to low overall efficiency in converting electrical power to useful EUV light. Replacing gas lasers with much more efficient solid-state lasers may significantly improve efficiency, as well as output power. It is currently however unclear what laser wavelength, and what plasma ‘recipe’ should be used. This is because we lack understanding of the underlying complex physics. The goal of project MOORELIGHT is to deliver the missing.

Application Deadline: Open until filled

Apply now

 

6. Fully Funded PhD Position in Atomic Origins of EUV light in Next-Generation EUV Light Sources 

Summary of PhD Program:

Understanding at the atomic level of the EUV generating processes is of key importance to be able to successfully develop the next generation of plasma light sources. Recently, our group discovered that EUV light must originate from transitions between complex multiply excited electronic states, and not from the singly excited states decaying to the ground state as was the standing paradigm. We now face the enormous challenge of uniquely identifying such complex transitions. Currently, nobody truly knows where the EUV light stems from.

Application Deadline: Open until filled

Apply now

 

7. Fully Funded PhD Position in nanolithography

Summary of PhD Program:

The research activities of the Contact Dynamics group aim at investigating and providing fundamental understanding of the mechanisms underpinning friction, friction changes over time and friction variability, as affected by wear phenomena, at forces, scales and other preconditions relevant to present and future nanolithography technology. This includes rough surface contact mechanics, adhesion, tribochemical wear, thin film lubrication and novel coatings.

Application Deadline: Open until filled

Apply now

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